ALD
（1）ALD，originally called Atomic Layer Epitaxy（ALE）, also known as atomic layer chemical vapor deposition(ALCVD）。It brings at least two gas phase precursor species in the base of heating reactor, it will not stop automatically until surface saturation of chemisorption, suitable process temperature obstruct molecule physical adsorption in the surface。
（2）The materials that can be deposited include: oxides, nitrides, fluorides, metals, carbides, composite structures, sulfides, nano-thin layers, etc.